The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2002
Filed:
Sep. 22, 2000
Prasad S. Apte, East Amherst, NY (US);
Shawn W. Callahan, Tonawanda, NY (US);
Praxair Technology, Inc., Danbury, CT (US);
Abstract
A cold isopressing method in which first and second layers of at least two layers are formed within an isopressing mold and the second of the layers is isostatically pressed against the first of the layers to compact the second layer. The layers can be formed from different materials, for instance granular materials or slurries. Each layer can additionally have different levels of materials. The granular materials can have pore formers to produce intermediate porous layers. Channel forming materials can be positioned between layers during isopressing. Alternatively, the first layers can be preformed by extrusion, slip casting or injection isopressing molding. One or more of the layers can have two or more regions of different ceramic materials.