The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2002
Filed:
Jan. 05, 2001
Applicant:
Inventors:
Adam T. Lee, Dallas, TX (US);
Karl T. Chuang, Edmonton, Alberta, CA;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01F 3/04 ;
U.S. Cl.
CPC ...
B01F 3/04 ;
Abstract
A gas/liquid contacting apparatus is provided wherein sedimentation of particulate solids at the corner of liquid overflow weirs of perforated trays is substantially reduced. This is achieved by bowing outwardly in a downstream direction the overflow weirs, to even out the liquid flow over them, and providing downcomer chutes from the weirs, which conform to the weir contour at the upper end. The downcomer chutes have sides converging in a downstream direction on a base to draw liquid away from the weir sides. The invention may be used in a single, two or four pass gas/liquid contacting apparatus.