The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2002
Filed:
Aug. 27, 1999
Dinesh Nair, Austin, TX (US);
Lothar Wenzel, Round Rock, TX (US);
Nicolas Vazquez, Austin, TX (US);
Samson DeKey, Austin, TX (US);
National Instruments Corporation, Austin, TX (US);
Abstract
A system and method for improved image characterization, object placement, and mesh design utilizing Low Discrepancy sequences. The Low Discrepancy sequence is designed to produce sample points which maximally avoid one another, i.e., the distance between any two sample points is maximized. The invention may be applied specifically to methods of image characterization, pattern matching, acquiring image statistics, object location, image reconstruction, motion estimation, object placement, sensor placement, and mesh design, among others. Image characterization is performed by receiving an image and then sampling the image using a Low Discrepancy sequence, also referred to as a quasi-random sequence, to determine a plurality of sample pixels in the image which characterize the image. Sensor placement is performed by generating a Low Discrepancy sequence for the desired placement application, and then selecting locations for the optimal placement of sensors using the generated Low Discrepancy sequence.