The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2002
Filed:
Jun. 26, 2000
Alexander B. Beaman, San Jose, CA (US);
David G. Opstad, Mountain View, CA (US);
Apple Computer, Inc., Cupertino, CA (US);
Abstract
Aspects for achieving enhanced glyphs of a font are presented. In a method aspect, the method includes determining a glyph layer description for a selected glyph, and accessing at least one contour for the selected glyph. The method further includes accessing at least one layer style for the at least one contour of the selected glyph, and rendering the selected glyph in accordance with the at least one layer style to produced an enhanced glyph. In a system aspect, the system includes a mechanism for providing a hinted path. A glyph layer processor is coupled to the mechanism for providing and receives the hinted path. The glyph layer processor outputs enhanced glyph data. A drawing client for receiving the enhanced glyph data from the glyph layer processor for output from a computer system is further included.