The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2002

Filed:

Jul. 25, 2000
Applicant:
Inventor:

Stefaan Demey, Brugge-St. Michiels, BE;

Assignee:

N.V. Michel Van de Wiele, Kortrijk/Marke, BE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D03D 2/706 ;
U.S. Cl.
CPC ...
D03D 2/706 ;
Abstract

A fabric with a rib structure, in particular a false boucle carpet, with cut pile ( ) and/or pile loops ( ) is formed by a method for weaving such a fabric. On a weaving machine, such as a rod weaving machine, a backing fabric is woven by bringing weft yarns ( ), ( ), ( ) between warp yarns ( ) in successive weft insertion cycles, alternately weaving in warp yarns ( ), ( ) in the backing fabric and rib-formingly passing them around over at least one weft yarn ( ). In a number of weft insertion cycles a loop-forming element ( ), such as for example a wire or a wire with a blade, is provided above the backing fabric and at least one pile warp yarn ( ), ( ) is loop-formingly passed around over this loop-forming element (10). This method enables weaving of a fabric with a very varied appearance, because apart from the false boucle effect, areas with pile loops ( ) and/or areas with cut pile ( ) can also be obtained.


Find Patent Forward Citations

Demey, Stefaan. (2002). False bouclé fabrics with cut pile and/or pile loops, and method for the weaving thereof (U.S. Patent No. 6367514). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6367514

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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