The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2002

Filed:

Dec. 18, 1998
Applicant:
Inventors:

Muneki Hamashima, Urayasu, JP;

Akihiro Goto, Setagaya-ku, JP;

Hiroshi Nishimura, Zushi, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/726 ;
U.S. Cl.
CPC ...
H01J 3/726 ;
Abstract

Electron beam type inspection device for generating images of specimens (e.g., silicon wafers, etc.) includes an electron gun which emits an electron beam, an electron beam optical system which causes the electron beam to form an irradiation region on a surface of a specimen, a detector which detects at least one of second order electrons and reflected electrons reflected by the irradiation region, a projection optical system projecting the second order electrons and the reflected electrons onto a detection surface within the detector. The second order electrons and the reflected electrons correspond to an observation region within the irradiation region. The inspection device also includes a magnification controller which controls the size of the observation region and the magnification of the projection optical system, and an irradiation controller which controls the current density of the irradiation region based on the size of the observation region. Also provided is a method of making a corresponding inspection device which includes steps of providing and assembling the aforementioned component parts.


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