The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2002
Filed:
Feb. 29, 2000
Dennis M. Borowy, Hanover, NH (US);
Tianting Ren, Lebanon, NH (US);
Hypertherm, Inc., Hanover, NH (US);
Abstract
This invention relates to methods and apparatus for controlling a power supply of a plasma arc system. According to the method, any AC input voltage within a range of input voltages is provided into the input stage and a rectified output voltage is thereby generated. The rectified output voltage is provided into the power factor corrected boost stage and a DC signal is thereby generated. The DC signal is provided into an auxiliary power supply and a regulated power signal is thereby generated. The regulated power signal is provided into a digital signal processor module and an output control signal is thereby generated. The output control signal is provided into the inverter stage and a plasma arc current is thereby generated.