The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2002
Filed:
Aug. 08, 2000
Applicant:
Inventors:
Volker Wege, Krefeld, DE;
Ralf Dujardin, Willich, DE;
Yun Chen, Krefeld, DE;
Johann Rechner, Kempen, DE;
Friedrich-Karl Bruder, Krefeld, DE;
Assignee:
Bayer Aktiengesellschaft, Leverkusen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 3/202 ; C08F 3/208 ;
U.S. Cl.
CPC ...
C08F 3/202 ; C08F 3/208 ;
Abstract
Amorphous polymers, including homopolymers and co-polymers, containing residues of vinyl cyclohexane and/or substituted vinyl cyclohexane are described. The polymers of the present invention have a syndiotactic configuration in which the quantity of diads is greater than 50.1% and less than 74%. The polymers of the invention have high transparency, low birefringence and high heat defection temperature, and can be used to prepare molded articles (e.g., optical data storage media and lenses) and films.