The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2002
Filed:
Jan. 06, 2000
Applicant:
Inventors:
Changming Li, Phoenix, AZ (US);
Song Shi, Phoenix, AZ (US);
George Maracas, Phoenix, AZ (US);
Vi-En Choong, Chandler, AZ (US);
Assignee:
Motorola Inc., Northbrook, IL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 1/00 ;
U.S. Cl.
CPC ...
G01N 1/00 ;
Abstract
The present invention provides a method to characterize, optimize, and control the quality and production of hydrogel media. Additionally, the present invention provides a method for determining the size, size distribution, and spatial distribution of the pores of a porous substrate. More particularly, the invention provides a method for determining the size, size distribution, and spatial distribution of the pores of a polymeric hydrogel-based substrate.