The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2002
Filed:
Sep. 23, 1999
Ming-hsun Yang, Hsinchu, TW;
Ji-Chen Wu, Hsinchu, TW;
Arnold Chang-mou Yang, Hsinchu, TW;
Chen-hua Lin, Hsinchu, TW;
Wisertek International Corporation, Hsinchi, TW;
Abstract
A method in accordance with present invention comprises the steps of: forming a micro-control apparatus having a plurality of ejecting elements; forming a first layer of film on said micro-control apparatus and forming a plurality of ink chambers in the first layer of film; forming a second layer of photosensitive film on said first layer of film and forming an ink orifice in said second layer of photosensitive film relative to each of said plurality of ink chambers in the first layer of film by photolithography. The method for manufacturing the printhead in accordance with the present invention is relatively simple. Using this method, the application of a nozzle plate to a dry film photoresist and the precision alignment between ink orifices and ink chambers in manufacturing a conventional printhead can be avoided so that the throughput and yield rate can be increased.