The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2002

Filed:

Aug. 15, 2000
Applicant:
Inventors:

Hyun-Kwang Seok, Seoul, KR;

Jae-Chul Lee, Seoul, KR;

Jong-Woo Park, Seoul, KR;

Young-Hoon Chung, Seoul, KR;

Ho-In Lee, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B21C 2/300 ;
U.S. Cl.
CPC ...
B21C 2/300 ;
Abstract

The present invention relates to a shear deformation device. To improve the productivity by solving the problem that the amount of shear deformation of a material is not uniform and sufficient due to the gap between the curved portion of the molding path and the lower parts of the material and omitting any additional process for removing irregularity and surface products on the surface of the material, there is provided a shear deformation device capable of scalping, characterized in that a scalping guide path which allows the surface of the material to be separated from the other portions of the material as the material is scalped at a predetermined thickness when passing through the curved portion during shear deformation is formed in the curved portion in communication with the molding path. In addition, there are provided additional constructions for effectively performing shear deformation by a small power by reducing the friction at the molding path excepting the curved portion. The present invention thusly constructed can be utilized for continuously and effectively mass-produce sheared materials.


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