The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2002
Filed:
Apr. 28, 1999
Allan Chiwan Cheung, Lexington, KY (US);
Scott Michael Heydinger, Lexington, KY (US);
Lexmark International, Inc., Lexington, KY (US);
Abstract
Halftoning algorithms such as error diffusion, blue noise mask, and void and cluster mask are known to produce visually pleasing, random, homogeneously distributed patterns of dots on output devices such as color displays or printers, for example. These algorithms are extended to take advantage of the mechanisms of each that cause a homogeneous distribution of dots of one colorant to produce a substantially homogeneous distribution of dots when using multiple colorants. The number of dots of each colorant are combined to form an output dot level number of dots that is caused to be substantially homogeneously distributed.