The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2002
Filed:
Oct. 22, 1999
Ian Manners, Oakville, Ontario, CA;
Keith G. Balmain, Toronto, Ontario, CA;
Charles H. Hersom, Lakeshore Blvd., West, Toronto Ontario, CA;
Other;
Abstract
The present invention provides a method and materials for reducing or limiting charge accumulation and the resulting arc discharges in components used in space vehicles such as satellites prone to charge buildup due to exposure to a charge flux. The material is found in the poly(metallocene) family. In each member of this family, a metal atom is an integral part of the polymer chain, the whole structure being held together (and the interactions provided) by chemical bonds rather than by the proximity of the components in a heterogeneous mechanical mixture. In a homogeneous dielectric, the needed conductivity may be radiation-induced or it may be achieved as the result of doping. The components may be coated with, or alternatively fabricated from, a material including the poly(metallocene) as a constituent.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile