The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2002

Filed:

Oct. 23, 2000
Applicant:
Inventor:

Masaki Shinohara, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/02 ;
U.S. Cl.
CPC ...
B05D 3/02 ;
Abstract

The present invention provides a resist film baking apparatus including a substrate placing block which can be deformed, a baking plate having an inner void , and a temperature regulator connected to the baking plate for circulating a temperature regulating liquid in the inner void . This configuration enables to uniformly heat a substrate so as to obtain a resist film having a uniform thickness, which in turn enables to obtain an accurate element pattern.


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