The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2002
Filed:
Jun. 13, 2000
Applicant:
Inventors:
Eric R. Kent, San Jose, CA (US);
Vince L. Marinaro, Sunnyvale, CA (US);
Ted Wakamiya, San Ramon, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 1/700 ;
U.S. Cl.
CPC ...
B05B 1/700 ;
Abstract
A dual tip nozzle replaces a single tip nozzle in a resist applicator station to double the number of photoresists that are available. The resist applicator station is of the type having a nozzle holder block, at least one single tip nozzle attached to the nozzle holder bock, and a first resist line extending through the nozzle holder block and into engagement with the nozzle. The dual tip nozzle includes two cavities having respective orifices. Each cavity receives a separate resist line for dispensing separate photoresists.