The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2002
Filed:
Nov. 23, 1999
Vladimir A. Kogan, Almelo, NL;
U.S. Philips Corporation, New York, NY (US);
Abstract
An apparatus for X-ray analysis of materials advantageously utilizes a parabolic multilayer mirror for parallelizing the X-rays. Moreover, it may be desirable to monochromatize the parallelized radiation, for example by means of a crystal monochromator. According to the invention an influencing device for the X-rays is constructed as a single mechanical unit comprising a combination of an X-ray mirror ( ) and a monochromator ( ). This unit ( ) can be arranged in the analysis apparatus in at least two positions ( ) in such a manner that the X-rays travel via the X-ray mirror ( ) and the monochromator ( ) in the first position ( ) whereas the X-rays travel only via the X-ray mirror ( ) in the second position ( ). Consequently, no separate units comprising only an X-ray mirror or a combination of an X-ray mirror and a monochromator are required, so that a substantial saving in costs is achieved.