The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2002
Filed:
Sep. 20, 1999
Naoki Nakamura, Shizuoka-ken, JP;
Hiroshi Hasegawa, Shizuoka, JP;
Kiyohito Murata, Susono, JP;
Hideki Nakayama, Susono, JP;
Toyota Jidosha Kabushiki Kaisha, Toyota, JP;
Abstract
A method for manufacturing a nonlinear optical thin film of a silica glass system with sufficient nonlinear optical characteristics, in which a glass substrate is disposed within a vacuum deposition chamber and an electron beam is applied to a SiO —GeO -system glass placed on a hearth liner to form a SiO —GeO -system thin film on the surface of the substrate . In an application of this method, ions of argon, for example, are emitted from an ion source to produce dipoles in the deposited SiO —GeO -system thin film. By applying an electric field to the SiO —GeO -system thin film thus formed, the dipoles are oriented to let the thin film exhibit nonlinear optical characteristics.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile