The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2002
Filed:
May. 10, 2000
Matsushita Electric Industrial Co., Ltd., Osaka-fu, JP;
Abstract
A plasma processing method that controls an interior of a vacuum chamber to a specified pressure by introducing gas into the vacuum chamber and evacuating the interior of the vacuum chamber. A high-frequency power having a frequency of 50 MHz to 3 GHz is supplied to a site of an antenna other than its center and periphery with the antenna provided opposite to a substrate in the vacuum chamber, in a state where a general center of the antenna and the vacuum chamber are short-circuited to each other. Meanwhile, the interior of the vacuum chamber is controlled to the specified pressure, and plasma is generated within the vacuum chamber and the substrate placed on a substrate electrode is processed within the vacuum chamber.