The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2002
Filed:
Nov. 22, 1995
Applicant:
Inventors:
Masato Fujinaga, Hyogo, JP;
Shinya Soeda, Hyogo, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract
A technique of correcting a mask pattern without alleviating the design rule or measuring all contact hole diameters. Undulations are inspected in a region for forming contact holes (step S ). On the basis of the surface shape (undulations) determined at step S , the contact hole diameter is predicted in the case of use of the mask hole diameter fabricated at step S (step S ). On the basis of the result of prediction, the mask pattern M is corrected to mask patter M′ according to the mask hole diameter (step S ).