The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2002
Filed:
Nov. 22, 2000
Elwin Schomaker, Velp, NL;
Johannes Bos, Westervoort, NL;
Akzo Nobel N.V., Arnhem, NL;
Abstract
Porous, preferably dimensionally stable material and a method for using for the removal of gaseous impurities from a gas mixture, such as H S, COS, CH , and SO , into the pores of which there is incorporated a secondary amine which chemically bonds with the constituents to be removed, with the material including a hydrophobic polymer with pores having an average diameter in the range of from 0.1 to 50 &mgr;m and a secondary amine having hydrophobic properties which optionally is incorporated into a hydrophobic liquid is disclosed. Favorable results have been attained using polypropylene as the hydrophobic polymer and ditridecyl amine as the secondary amine, with a tertiary amine, such as C to C -alkyl diethanol amine, being part of the hydrophobic liquid.