The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2002
Filed:
Mar. 11, 1998
Applicant:
Inventor:
Thomas Walsh, Templeton, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 5/00 ; B24B 5/08 ; B24B 5/313 ;
U.S. Cl.
CPC ...
B24B 5/00 ; B24B 5/08 ; B24B 5/313 ;
Abstract
A parallel alignment device for chemical mechanical polishing using a plurality of carrier devices ( ) rotatably coupled to a turret means. The apparatus ( ) includes a turret and plurality of rotatable polishing surfaces ( ) positioned around the turret. The apparatus also includes a plurality of carrier devices ( ) rotatably coupled to the turret, where the carrier devices ( ) are each adapted to hold a workpiece to be polished on at least one of the rotatable polishing surfaces. Each of the carrier devices is operably independently to each other during a process for chemical mechanical polishing.