The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2002

Filed:

Sep. 29, 2000
Applicant:
Inventors:

Constance J. Thornton, Ontario, NY (US);

T. Edwin Freeman, Webster, NY (US);

Theodore Lovallo, Williamson, NY (US);

Edward L. Schlueter, Jr., Rochester, NY (US);

Joseph A. Swift, Ontario, NY (US);

Xiaoying (Elizabeth) Yuan, Fairport, NY (US);

Assignee:

Xerox Corporation, Stamford, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 1/500 ; G03G 1/501 ;
U.S. Cl.
CPC ...
G03G 1/500 ; G03G 1/501 ;
Abstract

Seamed belts, in particular puzzle-cut imageable seam intermediate transfer belts and electrophotographic printing machines that use such transfer belts, that are resistant to unzipping. The seamed belts include a first substrate having a first end and a second end that mate to form a first seam that runs across the first substrate. Along at least one side edge of each end of the first substrate is a cut-out. With the first end and the second end mated to form the first seam the cut-outs align to form a larger cut-out. A second substrate is then fitted into the larger cut-out along a second seam. Beneficially, an adhesive is disposed over the first seam and the second seam. Imageable seam intermediate transfer belts have first and second substrates that are beneficially semiconductive and puzzle-cut seams.


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