The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2002
Filed:
Jul. 22, 1999
Francis E. LeVert, Knoxille, TN (US);
David S. Krafsur, Lenoir City, TN (US);
E. Beth Pardue, Lenoir City, TN (US);
V. Carol Bailey, Knoxville, TN (US);
Technology for Energy Corporation, Knoxville, TN (US);
Abstract
A radioisotope based x-ray residual stress analysis apparatus having a shielded, monoenergetic radioisotopic source to emit x rays for measurement of the stress state of a polycrystalline material. The isotropic source is selected from spontaneously emissive radioisotopes emitting photons in the 5-100 keV energy range. The emissions of the source assembly are measured using either a conventional, solid-state, position sensitive detector or a gas filled position sensitive proportional counter (PSPC). In addition to normal residual stress analysis, the use of a PSPC allows the identification of characteristic photons emitted by particular isotopes to identify trace elements within a sample. As a result of the minimal shielding required for the source assembly and the small size of the isotropic source, the x-ray residual stress analysis apparatus of the present invention is uniquely suited to be configured with an area detector. Finally, the present invention is designed to be powered by commercially available dc batteries allowing residual stress analysis to be performed in remote locations, such as bridges and deserts, where power supplies are not readily available.