The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2002

Filed:

May. 14, 1999
Applicant:
Inventors:

Tadashi Kimura, Kobe, JP;

Fumiaki Ueno, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 1/100 ; G11B 7/26 ; B29C 3/338 ;
U.S. Cl.
CPC ...
B29D 1/100 ; G11B 7/26 ; B29C 3/338 ;
Abstract

The present invention provides a method for manufacturing optical disk substrates whereby grooves and pits of optical disk substrates are formed highly accurately and finely, so that resulting optical disks can be of large-capacity and reduced in noise level. A coat of an organic material is provided on a substrate which is to be a master, on which a mask material is patterned as an etching mask. After the coat of the organic material is etched, the mask material is removed, whereby a master is obtained. A metallic coat is formed to the master. A metallic main body portion is integrally formed on the metallic coat. A metallic portion comprising the metallic coat and metallic main body portion is separated from the master. A metallic stamper is thus formed.


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