The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2002

Filed:

Jul. 22, 1999
Applicant:
Inventors:

Felix Mayer, Zurich, CH;

Oliver Paul, Au, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 1/18 ;
U.S. Cl.
CPC ...
H05K 1/18 ;
Abstract

A process is given for permitting the application to a substrate ( ) of a microsystem or transducer ( ) having a first partial surface ( ), whose interaction with the environment is to be possible, and a second partial surface ( ), which is to be protected against external influences. The substrate ( ) is prepared, a passage point ( ) being produced in said substrate ( ). The microsystem ( ) and substrate ( ) are so mutually positioned that the first partial surface ( ) faces the substrate ( ) and that the passage point ( ) in the substrate ( ) and the first partial surface ( ) come to rest opposite one another. Contacts ( ) are produced by flip-chip technology. A sealing contact ( ) seals the second partial surface ( ) against external influences. A gap ( ) between the microsystem ( ) and substrate ( ) is filled with a filling material ( ). A selective cover ( ) over the passage point ( ) keeps undesired external influences away from the first partial surface ( ). The microsystem ( ) can e.g. contain a sensor, the first partial surface ( ) containing the sensitive surface and the second partial surface ( ) electronic functional units.


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