The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2002
Filed:
Mar. 26, 1999
Applicant:
Inventors:
Akira Fujishima, Kawasaki, JP;
Hideki Masuda, Hachioji, JP;
Assignee:
The University of Tokyo, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B31D 3/00 ;
U.S. Cl.
CPC ...
B31D 3/00 ;
Abstract
A method for producing a porous diamond according to the present invention comprises steps of forming an anodized alumina layer, which functions as a mask, on a diamond substrate; and performing a plasma etching treatment to form pores on the diamond substrate, which pores have the same arrangement as those of the anodized alumina mask.