The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2002
Filed:
Jul. 14, 2000
Applicant:
Inventor:
Toshio Fujiwara, Tokyo, JP;
Assignee:
Kabushiki Kaisha Miyake Design Jimusho, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D03D 3/00 ;
U.S. Cl.
CPC ...
D03D 3/00 ;
Abstract
A fabric woven under a double weave by using a jacquard machine, which has a first layer for forming front bodies of garments and a second layer for forming back bodies of the garments. The first and second layers are connected with each other by interwoven portions along substantially closed contour lines (outlines) as repeated patterns. The fabric is subjected to a cutting along the contour lines, while the interwoven portions are at least partly left except at locations where openings for passage of parts of a human body are to be formed. As a result, a garment can be obtained without any substantial sewing process.