The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2002
Filed:
Jul. 09, 1999
Scott Quigley, Townville, SC (US);
Geschmay Corp., Greenville, SC (US);
Abstract
A seamed endless papermaking fabric for use with papermaking machines. The fabric includes a plurality of CMD (cross machine direction) yarns intermeshing with a plurality MD (machine direction yarns) in a selected intermeshing pattern forming a contact surface and a support surface. The MD yarns, which are arranged to extend beyond the endmost of the CMD yarns at the opposed first and second ends of the fabric, form a plurality of spaced seaming loops across the fabric. These loops are adapted to interleaf and receive a pintle which forms the seam forming the fabric endless. A first pair of additional yarns are intermeshed in a first intermeshing pattern repeat with the MD yarns outwardly of the endmost of the CMD yarns at one of the opposed ends and a second pair of additional yarns are intermeshed in a second intermeshing pattern repeat with the MD yarns outwardly of the endmost of the CMD yarns at the other of the opposed ends. These first and second pairs of additional yarns separate the endmost CMD yarns from the pintle. The additional yarns are multi-filament yarns while the MD yarns are monofilament yarns.