The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2002

Filed:

Mar. 10, 2000
Applicant:
Inventor:

Sachiko Yabe, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 2/108 ;
U.S. Cl.
CPC ...
G01B 2/108 ;
Abstract

A film thickness distribution measuring method according to the present invention comprises the following steps of measuring a step form lying within a predetermined interval including a substrate exposure region having a coordinate point defined as a measurement reference on a substrate having steps to thereby extract first data L , forming an organic film over the substrate and thereafter measuring a step form lying within the predetermined interval to thereby extract second data L , measuring the thickness of the organic film and adding the thickness to the second data L to thereby extract third data L , and determining a difference (L −L ) between the third data L and the first data L to thereby measure a continuous film thickness distribution of the organic film formed over the substrate.


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