The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2002
Filed:
Oct. 27, 1999
Applicant:
Inventors:
Shyh-Yeu Wang, Tao Yuan Hsien, TW;
Jen-Hua Chung, Chang Hua Hsien, TW;
Chwei-Jing Yeh, Taipei Hsien, TW;
Assignee:
Ritek Corporation, Hsin Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/02 ;
U.S. Cl.
CPC ...
B32B 3/02 ;
Abstract
An optical recording medium is provided that includes a spirally grooved polymer substrate, a recording layer, a reflecting layer, and a protection layer. The recording layer includes one or a mixture of phthalocyanine dyes. The phthalocyanine dye includes a bicyclo-alkyl substituent, providing solubility in any of a plurality of solvents that will not damage the surface of the substrate.