The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2002
Filed:
Feb. 25, 2000
Dennis M. Hayden, Essex Junction, VT (US);
Timothy E. Neary, Essex Junction, VT (US);
John N. Ross, St. Albans, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention discloses a method of controlling the precise removal of unwanted material from a light transmittable substrate for isolating and removing defects from a surface of the light transmittable substrate and for direct writing of a reticle or photomask, and the resultant reticle or photomask. The depth of ion implantation of a light absorbing material such as gallium, arsenic, boron, phosphorus, antimony or combinations thereof into the defect and/or the areas surrounding the defect on the light transmittable substrate controls the depth of material removed from the substrate. Unexpectedly, the use of laser ablation at pulses not greater than 10 seconds to remove the unwanted material provides precision removal while preventing heat damage to the substrate.