The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2002
Filed:
Aug. 23, 1999
Samuel Dacke Harkness, IV, Sunnyvale, CA (US);
Qixu (David) Chen, Fremont, CA (US);
Zhong (Stella) Wu, Fremont, CA (US);
Rajiv Yadav Ranjan, San Jose, CA (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
Magnetic recording media exhibiting enhanced SMNR are formed with an NiAlO sub-seedlayer for microstructural control of the underlayer to enable deposition and growth of a magnetic layer exhibiting a (10{overscore (1)}0)-predominant crystallographic orientation and small, uniform grain size. Embodiments include completely reactive sputter depositing a NiAlO sub-seedlayer on a glass-ceramic substrate and sequentially depositing thereon a NiAl seedlayer, a Cr or Cr-alloy underlayer, e.g., CrMo, a Co—Cr magnetic layer and a protective overcoat, e.g., carbon. The resulting magnetic recording media exhibit a high SMNR, high OW, narrow PW50, improved jitter and improved Hr.