The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2002
Filed:
May. 14, 1999
Applicant:
Inventors:
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/18 ; C23C 1/632 ; C23C 1/636 ;
U.S. Cl.
CPC ...
H05H 1/18 ; C23C 1/632 ; C23C 1/636 ;
Abstract
The present invention provides a process for synthesizing one-dimensional nanosubstances. A membrane having channels serves as the host material for the synthesis. The anodic membrance is brought into contact with a microwave excited plasma of a precursor gas using an electron cyclotron resonance chemical vapor deposition (ECR-CVD) system. Parallel aligned nanosubstances can be synthesized in the channels of the membrane over a large area. Carbon nitride nanosubstances are synthesized successfully for the first time in the present invention.
Shih, Han-Chang. (2002). Process for synthesizing one-dimensional nanosubstances by electron cyclotron resonance chemical vapor deposition (U.S. Patent No. 6346303). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6346303
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile