The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2002
Filed:
Oct. 22, 1999
Evan George Colgan, Chestnut Ridge, NY (US);
James McKell Edwin Harper, Yorktown Heights, NY (US);
Kenneth Parker Rodbell, Sandy Hook, CT (US);
Hiroshi Takatsuji, Machida, JP;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for achieving, and a structure containing, a thin film refractory metal with a generally symmetric microstructual morphology. Incorporation of between 1 and 5% by atomic fraction nitrogen into the refractory metal selected from the group of Ti, V, Cr, Nb, Mo, Ta, W and alloys thereof results in the desired structural morphology and electrical resistance. Multi-layer structures can be built up of alternate layers of refractory metal with and without nitrogen to achieve a desired product. Alternate layers can vary in thickness and nitrogen content.