The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2002

Filed:

Jun. 19, 2000
Applicant:
Inventors:

David Mendlovic, Petach Tikva, IL;

Zeev Zalevsky, Rosh Haayin, IL;

Naim Konforti, Holon, IL;

Emanuel Marom, Tel Aviv, IL;

Gal Shabtay, Petach Tikva, IL;

Uriel Levy, Petach Tikva, IL;

Sharon Karako, Yahud, IL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01C 3/00 ; G01C 3/08 ; G02B 2/742 ;
U.S. Cl.
CPC ...
G01C 3/00 ; G01C 3/08 ; G02B 2/742 ;
Abstract

A super-resolving imaging apparatus employs diffractive optical elements placed on the imaging lens. This element, and the use of a modified Scheimpflug arrangement allow the conversion of degrees of freedom in one axis of a field of view to a larger degree of freedom in another axis in order to obtain a high resolution image with a wide depth of focus and large field of view. Replicas created by the diffractive elements are mutually shifted by subpixel amounts, and are combined using a Gabor transform, which is facilitated by a spatial mask placed over the detector array. The apparatus is suitable for performing distance estimation on an object within the field of view.


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