The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2002
Filed:
Oct. 12, 1999
Applicant:
Inventors:
Ryszard Burzynski, Kenmore, NY (US);
Deepak N. Kumar, Tonawanda, NY (US);
Saswati Ghosal, Amherst, NY (US);
Dale R. Tyczka, Lansdale, PA (US);
Assignee:
Laser Photonics Technology Inc., W. Amherst, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/04 ;
U.S. Cl.
CPC ...
G03H 1/04 ;
Abstract
New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.