The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6344275 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 05, 2002

Filed:

May. 14, 2001
Applicant:
Inventors:

Masahiro Katsumura, Tsurugashima, JP;

Tetsuya Iida, Tsurugashima, JP;

Takashi Ueno, Tokyo-to, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 1/504 ; B32B 1/706 ;
U.S. Cl.
CPC ...
B32B 1/504 ; B32B 1/706 ;
Abstract

To present a material for stamper free from deterioration of stamper quality due to reaction with an electron-attracting radical contained in the resist material. An electrode formed on the surface of a patterned resist film for electrocasting a stamper material is formed of a nickel alloy thin film comprising Ni element as a principal component, and Ru element added in a range of less than 25 percent by weight.


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Katsumura, Masahiro. (2002). Electrode material for forming stamper and thin film for forming stamper (U.S. Patent No. 6344275). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6344275

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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