The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2002

Filed:

Dec. 08, 1999
Applicant:
Inventors:

Kyu Hong Ahn, Seoul, KR;

Ick Tae Yeom, Seoul, KR;

Hyung Jib Lee, Seoul, KR;

Suh Hyung Lee, Seoul, KR;

Kil Jae Lee, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 3/02 ; C02F 9/00 ;
U.S. Cl.
CPC ...
C02F 3/02 ; C02F 9/00 ;
Abstract

An Intermittently Decanted Extended Aeration (IDEA) process characterized in that an aeration period, a settling period and a decanting period are successively repeated in that order in a single reactor, and influent wastewater is transversely supplied at the bottom of the reactor and slowly diffused in the reactor while treated wastewater wich is intermittently discharged during the decanting period is provided. According to the process of the invention, wastewater can be efficiently treated without by-pass of wastewater under dry weather and wet weather conditions as well as stormy weather condition.


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