The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2002
Filed:
May. 03, 2000
Satoshi Hasaka, Tokyo, JP;
Kenji Shigeta, Tokyo, JP;
Takashi Kuroiwa, Tokyo, JP;
Tomoaki Hoshi, Tokyo, JP;
Hideki Seki, Tokyo, JP;
Toshiyuki Aida, Tokyo, JP;
Nippon Sanso Corporation, Tokyo, JP;
Abstract
An apparatus for supplying a semiconductor process gas charged in a large-capacity gas vessel to a plant where the gas is used, after reduction of the pressure of the gas. The gas cylinder is composed essentially of a cylindrical portion and hemispherical portions and formed at the ends of the cylindrical portion respectively. The gas cylinder has a gas charge port at one hemispherical portion and a gas discharge port at the other hemispherical portion both of which opening in alignment with the axis of the cylindrical portion . A charge valve and a gas discharge unit having at least a gas vessel valve and a pressure reducing valve are connected to the gas charge port and the gas discharge port respectively. The gas cylinder is housed together with the charge valve and the gas discharge unit in a container