The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2002
Filed:
Aug. 13, 1998
Ben Kim, South Burlington, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An apparatus and method are provided for cleaning (removing) contaminating particles and/or films from substrate surfaces such as semiconductor wafers during the fabrication process for making electronic components. The method and apparatus use a liquified gas contained in a distributor which has been energized with megasonic energy in the distributor and the energized liquefied gas directed as a stream against the surface to be cleaned from an outlet distribution nozzle of the distributor. The stream is preferably impinged on the substrate surface at an acute angle. The preferred liquified gas is carbon dioxide.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile