The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2002

Filed:

Mar. 01, 2000
Applicant:
Inventors:

James D. Lattimore, Safety Harbor, FL (US);

Micheal F. Erturk, Palm Harbor, FL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 7/20 ;
U.S. Cl.
CPC ...
H05K 7/20 ;
Abstract

A shutter mechanism for rack mounted chassis systems, comprising a first apertured shutter and a second apertured shutter, the first apertured shutter having a plurality of first holes formed therein in a first pattern, the second apertured shutter having a plurality of second holes formed therein in a second pattern, the first holes and the first pattern being configured relative to the second holes and the second pattern such that the shutters are positionable in a non-aligned position blocking air flow therethrough and in an aligned position allowing air flow therethrough, the shutters being movable to the non-aligned position when exposed to a temperature above a predetermined amount and means for positioning the first apertured shutter adjacent to the second apertured shutter allowing relative slidable movement thereof.


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