The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2002
Filed:
Apr. 27, 1999
Timothy Fillion, Bedford, MA (US);
Arkady Savikovsky, Needham, MA (US);
Jonathan S. Ehrmann, Sudbury, MA (US);
GSI Lumonics, Inc., Billerica, MA (US);
Abstract
In an optical-radiation patterning apparatus, a scan mirror ( ) so deflects laser light from a source ( ) as to draw a pattern on a substrate ( ). A focusing system ( ) forms a light spot on the substrate that is significantly narrower than the line to be drawn, and it thereby minimizes the sensitivity of the line-edge position to variations in light-spot size. To achieve the intended line width, an acousto-optical device ( ) introduces dither in the direction orthogonal to the light-spot motion that the scan mirror ( ) causes. The focusing system ( ) shapes the spot so that it is wider in the scan direction than it is in the dither direction, and this permits a relatively high scan rate for a given dither frequency.