The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 22, 2002

Filed:

May. 25, 1999
Applicant:
Inventors:

Eiichi Akutsu, Nakai-machi, JP;

Shigemi Ohtsu, Nakai-machi, JP;

Lyong Sun Pu, Nakai-machi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/20 ; G03G 5/024 ;
U.S. Cl.
CPC ...
G02B 5/20 ; G03G 5/024 ;
Abstract

To provide a process for recording an image using a photoelectrodeposition method having high general-purpose properties that require no restriction on the selection of a material used as a substrate, a process for recording an image having (A) arranging a substrate comprising a support a conductive film and a photosemiconductor thin film laminated in this order, in such a manner that at least the photosemiconductor thin film comes in contact with an electrodeposition solution (B) applying an electric current or a voltage to the conductive film and simultaneously irradiating the substrate with light from the side of the photosemiconductor thin film through the electrodeposition solution and (C) generating a photoelectromotive force on a light irradiated part, so as to form an electrodeposition film on the light irradiated part. The process for recording an image further comprises, if desired, (D) transferring the electrodeposition film onto an image retaining substrate such as ordinary paper.


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