The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2002
Filed:
Sep. 07, 1999
Sigeru Torii, Okayama-ken, JP;
Hideo Tanaka, Okayama, JP;
Yutaka Kameyama, Tokushima, JP;
Yoshihisa Tokumaru, Tokushima, JP;
Otsuka Kagaku Kabushiki Kaisha, Osaka, JP;
Abstract
The present invention is directed to a process for preparing an exo-methylenepenam compound wherein a cephem compound is reduced with a metal having a standard oxidation-reduction potential of up to −0.3 (V/SCE) in an amount of at least one mole per mole of the cephem compound and with a metal compound having a higher standard oxidation reduction potential than the metal and in an amount of 0.001 to 10 moles per mole of the cephem compound and wherein X is a halogen atom, lower alkylsulfonyloxy, trifluoromethanesulfonyloxy, trichloromethanesulfonyloxy, arylsulfonyloxy, toluenesulfonyloxy, or halogenated sulfonyloxy