The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2002
Filed:
Jun. 22, 2000
Applicant:
Inventors:
Isao Tsuruma, Kaisei-machi, JP;
Masayuki Naya, Kaisei-machi, JP;
Assignee:
Fuji Photo Film Co., Ltd., Kangawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
A photomask for use in near-field exposure includes a mask support which is transparent to exposure light; a shading film which is formed on one side of the mask support, and has at least one-opening arranged to form a predetermined pattern; and at least one filler which is transparent to the exposure light, and is arranged in the at least one opening with a predetermined height above the level of the boundary between the mask support and the shading film. The difference between the thickness of the shading film and the height of each of the at least one filler does not exceed 50 nanometers.