The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2002
Filed:
Apr. 03, 2000
Applicant:
Inventors:
Claus Dusemund, Spiesen-Elversberg, DE;
Rudolf Rhein, Heppenheim, DE;
Manuela Schweikert, Seeheim-Ober Beerbach, DE;
Martin Hostalek, Darmstadt, DE;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/00 ; C09G 1/02 ; C09G 1/04 ;
U.S. Cl.
CPC ...
C09G 1/00 ; C09G 1/02 ; C09G 1/04 ;
Abstract
The present invention relates to buffer systems in the form of solutions or salts for preparing suspensions which can be used for chemomechanical polishing. In particular, these buffer systems can be used for preparing suspensions having a high pH of 9.5-13 which are used for the chemomechanical polishing of Si and metal surfaces of semiconductors, known as wafers.