The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2002
Filed:
Apr. 24, 1998
Applicant:
Inventor:
Chung Chan, Newton, MA (US);
Assignee:
Silison Genesis Corporation, Campbell, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract
A cluster tool for providing plasma treatment to a substrate includes a plurality of chambers to provide plasma treatment to the substrate. At least one of the chambers performs ion implantation to the substrate. A dielectric window is provided on a surface of the chamber which performs ion implantation to the substrate. A plasma source is provided external to the chamber which performs ion implantation to the substrate. The plasma source is at a distance proximate enough to provide a plasma within the chamber.