The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2002
Filed:
Feb. 29, 2000
Kouki Okawauchi, Kanagawa, JP;
Sony Corporation, , JP;
Abstract
A defect inspection apparatus enabling more reliable and quicker detection of a defect present in the surface of a stacked film formed on a wafer and enabling reliable and quicker detection of a minute defect even if there is unevenness in the surface of the wafer, including a light source, a light frequency shifter unit for converting light from the light source to a plurality of beams of inspection light and a beam of reference light having close frequencies, an object lens upon which the beams of inspection light are incident and focusing the beams of light on the wafer to form a plurality of different focal points corresponding to the beams of inspection light, a laser scanning unit for making the beams of inspection light scan the wafer, a light detection unit and cofocal pinhole plate for detecting an intensity of a superposed light of the beams of reflected light and the beam of reference light at a cofocal point, and an analyzing unit serving as a contrast waveform generating means for generating and combining contrast waveforms in the scanning direction at focal positions based on the light intensity detected by the optical detection unit and defect inspection method.