The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2002
Filed:
Sep. 08, 1999
Applicant:
Inventors:
Christine Dehm, München, DE;
Carlos Mazure-Espejo, München, DE;
Assignee:
Siemens Aktiengesellschaft, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/18242 ; H01L 2/120 ; H01L 2/976 ; H01L 3/1119 ;
U.S. Cl.
CPC ...
H01L 2/18242 ; H01L 2/120 ; H01L 2/976 ; H01L 3/1119 ;
Abstract
A layer configuration includes a material layer and a diffusion barrier which blocks diffusing material components. The barrier is disposed in the vicinity of a layer boundary of the material layer and is formed predominantly in grain boundaries of the material layer. A process for producing a diffusion barrier is also provided.