The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2002
Filed:
Oct. 07, 1999
Atsumi Yamaguchi, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
An object is to enhance focus latitude and to suppress variations of widths due to different intervals in a resist pattern. A positive resist is applied on a substrate ( ) and then a first exposure is performed to provide a resist pattern ( ) patterned into lines arranged at equal widths and equal intervals. Subsequently, a resin ( ) containing an acid generator is applied on the substrate ( ) to cover the resist pattern ( ). Next, a second exposure is performed with a photomask ( ) to remove part of the resist pattern ( ).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile